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Ceramic Target

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Ceramic targets

Ceramic targets are relatively brittle targets. Usually, ceramic targets are used together with a backing plate. In addition to supporting the ceramic target during the sputtering process, the backing plate can also play a role in heat transfer during the sputtering process. There are many types of ceramic targets and a wide range of applications, mainly used in the field of microelectronics, displays, storage and other fields. As the basic material for the development of non-metallic thin film industry, ceramic targets have achieved unprecedented development.


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Types of ceramic targets and their respective applications

According to the application, it can be divided into semiconductor related ceramic targets, display ceramic targets, magnetic recording ceramic targets, optical recording ceramic targets, superconducting ceramic targets, giant magnetoresistance ceramic targets, etc.

Semiconductor related ceramic targets (HfO, SiO, Si3N4, MoSi, TaSi, WSi, TiSi, PLZT, ITO, mainly used in gate dielectric films. Diffusion film, diffusion barrier film, capacitor insulating film, transparent conductive film;

Display ceramic target ZnSMn, ZnS-Tb, ZnS-Sm, CaS-Eu, SrS-Ce, Si3N4, MgO

Magnetic recording ceramic target Si3N4, mainly used in magnetic head, magneto-optical disk (MO) protection;

Optical recording ceramic rake Si3N4, mainly used in optical disc protective film;

Superconducting ceramic targets YbaCuO, BiSrCaCuO, mainly used in superconducting thin films;

Giant magnetoresistance ceramic target, mainly used in thin film solar cell windows;

Other application targets InO, LiNbO, BaTiO, PZT. ZnO, mainly used in solar cells, piezoelectric thin films 

According to the chemical composition, it can be divided into oxide ceramic targets, silicide ceramic targets, nitride ceramic targets, fluoride ceramic targets and sulfide ceramic targets, etc. Among them, the flat display ITO ceramic target has been widely produced and applied in China. . Ceramic targets for high dielectric insulating films and giant magnetoresistance ceramic targets have broad application prospects.

Example

Oxide ceramic sputtering targets are the most common targets among advanced ceramic sputtering targets. Oxide ceramics can be made by sintering at high temperatures, with one or more oxides as the main constituent and other minor oxides as additives. They are divided into simple oxide ceramics and complex oxide ceramics. Common sputtering targets of this type include aluminum oxide (Al2O3), magnesium oxide (MgO), beryllium oxide (BeO), zirconium oxide (ZrO2), and others. Most oxide ceramics have high melting points, excellent insulation, thermal strength, antioxidant and corrosion properties. Therefore, they can be exposed to high temperature and oxidizing environment for a long time, and are worthy of wide application in engineering field.


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